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POU Applications

Applied Materials®

 

Chambers

Platforms

Process

Loops

Model

ASP(+)

Centura 5200 - Centura 2 & 300mm

Strip

Wall

3300

DPS – DPS II

Centura 5200 - Centura 2 & 300mm

Si

Cathode

3300

Wall

3300 2015

Metal

Cathode

3300

Wall

3300

eMax – eMax (DT)

Centura 5200 - Centura 2 & 300mm

Oxide

Cathode

3500

Wall

2015 3300

HART(+)

Centura 300mm

Si - DT

Cathode

3500

Wall

2015 3300

MxP(+) – eMxP+

P5000 - Centura 5200 - Centura 2

Si

Cathode

3300

Wall

3300

Metal

Cathode

3300

Wall

3300

Oxide

Cathode

3300

Wall

3300

PVD

Endura 5500 - Endura 2 (300mm)

Al - TiN

Platen

3300 3500

RPS

Centura 5200 - Centura 2

Strip

Cathode

3300

Wall

3300

Super e

Centura 5200 - Centura 2

Oxide

Cathode

3500

Wall

3300

 

 

 

 
Offering a Complete Range of Thermoelectric Temperature
Control Systems, Including Dynamic Point-of-Use Chillers
for Semiconductor Wafer Processing Equipment.
Copyright © 2008 Noah Precision, LLC. All Rights Reserved.
 
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of the respective trademark owners.
® and ™ denote United States trademarks.