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POU Applications

Lam Research®

 

Chambers

Platforms

Process

Loops

Model

4400 – 4400XLe

Standalone - Alliance

Si

Upper electrode

3300

Lower electrode

3300

4500 – 4500i

4500XLe

Standalone - Alliance

Oxide

Upper electrode

3300

Lower electrode

3300

4700 – 4700XLe

Standalone - Alliance

Metal

Upper electrode

3300

Lower electrode

3300

Exelan HPT / Flex

Alliance - 2300 (200 & 300mm)

Oxide

Upper electrode

 

Lower electrode

3300 3500

Kiyo

2300 (300mm)

Si

Lower electrode

3300

TCP 9100

Alliance

Oxide

Lower electrode

3500

TCP 9400

Standalone - Alliance

Si

Lower electrode

3300

TCP 9600

Standalone - Alliance

Metal

Lower electrode

3300

Versys

2300 - 2300 Domino

(200 & 300mm)

Si

Lower electrode

3300

Metal

Lower electrode

3300

 

 

 

 
Offering a Complete Range of Thermoelectric Temperature
Control Systems, Including Dynamic Point-of-Use Chillers
for Semiconductor Wafer Processing Equipment.
Copyright © 2008 Noah Precision, LLC. All Rights Reserved.
 
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of the respective trademark owners.
® and ™ denote United States trademarks.